主要技術參數與配置：
1.真空室容積：φ1100*1200mm
2.有效鍍膜區：φ700*850mm
3.可移出式轉架：無需定位，可任意位置移出，傳動可靠
4.陰極電?。?phi;160mm或φ140mm雙驅動動態磁控陰極電弧*12
5.IET離子刻蝕源：1套
Configuration：
Ⅰ.Vacuum chamber volume：Φ1100mm*h1200mm
Ⅱ.Effective coating area:Φ700*850mm
Ⅲ.Carousel：Removable
Ⅳ.Φ160mm or Φ140mm dynamic magnetically controlled cathode arc*12
Ⅴ.IET *1
技術特點：
該設備在PVD1012硬質涂層設備（8?。┑幕A上進行升級，陰極電弧的數量升級為12個（3組）。PVD1112的設計讓現場維護和保養十分方便，系統可以從兩側打開，所有系統部件都伸手可及。
Technical feature:
The equipment is upgraded on the basis of PVD1012 hard coating equipment (8 arcs), and the number of cathode arcs is upgraded to 12 (3 sets).The design of PVD1112 is very convenient for on-site maintenance. The system can be opened from both sides, and all the components of the system can be reached.
